Author : Dental Product Shopper
Published Date 10/02/2012
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Two formulations cover all self-etch bonding needs.

VOCO?s Futurabond has the distinction of being 1 of the original self-etch bonding agents when it was launched in 1998 in Germany. Since then, through continuous testing and research, Futurabond has evolved into 2 materials?Futurabond M and Futurabond DC?each of which is specifically formulated for different applications. With the Futurabond brand, it can be said that there truly is a universal self-etch bond for all indications.

In laboratory testing under ideal conditions (where the real conditions of actual chairside practice are eliminated), total-etch systems typically perform slightly better than self-etch systems. The difference, however, is usually statistically insignificant. In addition, laboratory testing is clinically irrelevant if the failure mode is cohesive, as opposed to adhesive?i.e. the fracture surfaces already show breaks in tooth structure or restorative. In real practice, the important factor is reproducibility. And the self-etch procedure?application in a single layer, the elimination of humidity control, and no risk of over-etching?provides more consistent, predictable results than more complicated total-etch protocols.

Nano Reinforced

The highly functionalized SiO2 nano particles (Ø 20 nm) in Futurabond facilitate a crosslink of the resin components and enhance its film-building properties. Thus, the adhesive can optimally wet the exposed collagen fibers and micro-retentive etching pattern on the enamel. Nano particles reinforce the hybrid layer for a long-lasting high bond strength. One-coat application of Futurabond is sufficient to guarantee a permanently stable bond of the composite to the tooth. Futurabond DC?s consistency ensures a ?stick immediately effect? that ensures the bond will not be blown out of the cavity while air drying. A combined stress-breaking area and hybrid layer of 9 ?m is created. This results in excellent marginal integrity and protection against sensitivities.